Mr. Kunihiko Kodama Profile

Kunihiko Kodama

at FUJIFILM Corp

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 14 August 2012

Design considerations for ultraviolet-nanoimprint lithography resists

Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu, Akiko Hattori, Kouji Shitabatake, Shinji Tarutani, Kunihiko Kodama, Hideto Tanabe

JM3, Vol. 11, Issue 3, 033008, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.033008

KEYWORDS: Etching, Quartz, Resistance, Fluorine, Nanoimprint lithography, Lithography, Photoresist processing, Silicon, Dry etching, Contamination

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Proceedings Article | 21 March 2012 Paper

Design considerations for UV-NIL resists

Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu, Akiko Hattori, Shinji Tarutani, Kunihiko Kodama, Hideto Tanabe, Kouji Shitabatake

Proceedings Volume 8323, 832305 (2012) https://doi.org/10.1117/12.915812

KEYWORDS: Etching, Quartz, Resistance, Nanoimprint lithography, Fluorine, Silicon, Photoresist processing, Dry etching, Contamination, Semiconducting wafers

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Proceedings Article | 14 October 2011 Paper

Fabrication of 20-nm half-pitch quartz template by nano-imprinting

Naotoshi Sato, Tadashi Oomatsu, Satoshi Wakamatsu, Katsuhiro Nishimaki, Toshihiro Usa, Kunihiko Kodama, Kazuyuki Usuki

Proceedings Volume 8166, 81661V (2011) https://doi.org/10.1117/12.896504

KEYWORDS: Nanoimprint lithography, Quartz, Silicon, Photomasks, Chromium, Photoresist processing, Etching, Scanning electron microscopy, Reactive ion etching, Nanofabrication

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Proceedings Article | 2 April 2011 Paper

Approaches to rapid resist spreading on dispensing based UV-NIL

Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu, Kenichi Kodama, Kunihiko Kodama

Proceedings Volume 7970, 79700S (2011) https://doi.org/10.1117/12.879200

KEYWORDS: Silicon, Quartz, Photoresist processing, Helium, Capillaries, Bridges, Semiconducting wafers, Nanoimprint lithography, Confocal microscopy, Lithography

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Proceedings Article | 11 April 2006 Paper

Materials and process parameters study on ArF immersion defectivity

Shinichi Kanna, Haruki Inabe, Kei Yamamoto, Toshiaki Fukuhara, Shinji Tarutani, Hiromi Kanda, Wada Kenji, Kunihiko Kodama, Koji Shitabatake

Proceedings Volume 6153, 615308 (2006) https://doi.org/10.1117/12.657805

KEYWORDS: Digital watermarking, Polymers, Lithography, Materials processing, Water, Photoresist processing, Silicon films, Scanners, Liquids, Head

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Proceedings Article | 14 May 2004 Paper

Novel transparent PAGs for 193-nm resists

Kunihiko Kodama, Kenichiro Sato, Shiro Tan, Fumiyuki Nishiyama, Tsukasa Yamanaka, Shinichi Kanna, Hyou Takahashi, Yasumasa Kawabe, Makoto Momota, Tadayoshi Kokubo

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.538049

KEYWORDS: Transparency, Line edge roughness, Lithography, Polymers, Deep ultraviolet, Absorption

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