Kunihiro Hosono
Senior Principal Specialist at Renesas Electronics Corporation
SPIE Involvement:
Conference Chair | Conference Program Committee | Symposium Chair | Author
Publications (25)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Metrology, Data storage, Metals, Inspection, Printing, Photomasks, Data conversion, Data storage servers, Standards development, Vestigial sideband modulation

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Manufacturing, Inspection, Design for manufacturing, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, System on a chip, Design for manufacturability

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metals, Image processing, Materials processing, Manufacturing, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Defect inspection

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Manufacturing, Computer simulations, Data processing, Photomasks, Beam shaping, Optical proximity correction, Computer aided design, Data conversion, Vestigial sideband modulation, Data analysis

Showing 5 of 25 publications
Conference Committee Involvement (8)
Photomask Japan 2010
13 April 2010 | Yokohama, Japan
Photomask and NGL Mask Technology
8 April 2009 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Showing 5 of 8 published special sections
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