Kunihiro Ugajin
at Toshiba Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 1 April 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Backscatter, Solids, Photomasks, Beam shaping, Nanoimprint lithography, Data conversion, Photoresist processing

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Optical lithography, Error analysis, Scanning electron microscopy, Photomasks, Beam shaping, Double patterning technology, Mask making, Photoresist processing, Vestigial sideband modulation

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Optical design, Optical lithography, Image analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Vestigial sideband modulation

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Thin films, Lithography, Etching, Inspection, Chromium, Photomasks, Critical dimension metrology, Photoresist processing, Photomask technology, Binary data

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Electron beam lithography, Electron beams, Reticles, Roads, Error analysis, Photomasks, Double patterning technology, Error control coding, Overlay metrology, Process engineering

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top