Kunio Watanabe
Group Executive Corporate Planning Development at Canon Inc
SPIE Involvement:
Publications (14)

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557753
KEYWORDS: Photomasks, Binary data, Phase shifts, Lithography, Nanoimprint lithography, Transmittance, Optical lithography, Chromium, Scanning electron microscopy, Resolution enhancement technologies

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534897
KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Line edge roughness, Lithographic illumination, Resolution enhancement technologies, Photoresist processing, Transmittance, Semiconductors, Fabrication

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535150
KEYWORDS: Lithography, Photomasks, Nanoimprint lithography, Lithographic illumination, Chromium, Quartz, Semiconducting wafers, Resolution enhancement technologies, Image resolution, Optical lithography

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504283
KEYWORDS: Phase shifts, Transmittance, Lithography, Electroluminescence, Photomasks, Optical lithography, Nanoimprint lithography, Optical simulations, Image transmission, Laser irradiation

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485322
KEYWORDS: Photomasks, Monochromatic aberrations, Computer aided design, Lithography, Wavefronts, Wavefront aberrations, Critical dimension metrology, Semiconducting wafers, Reticles, Semiconductors

Showing 5 of 14 publications
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