Kunio Watanabe
Group Executive Corporate Planning Development at Canon Inc
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Publications (14)

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Optical lithography, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Fabrication, Semiconductors, Lithography, Lithographic illumination, Transmittance, Photomasks, Nanoimprint lithography, Line edge roughness, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Quartz, Image resolution, Chromium, Photomasks, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Optical lithography, Electroluminescence, Laser irradiation, Image transmission, Transmittance, Photomasks, Optical simulations, Nanoimprint lithography, Phase shifts

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Quartz, Image resolution, Scanning electron microscopy, 3D printing, Printing, 3D metrology, Photomasks, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Image resolution, Electroluminescence, Image transmission, Transmittance, Photomasks, Optical simulations, Binary data, Resolution enhancement technologies, Phase shifts

Showing 5 of 14 publications
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