Kunishige Edamatsu
Senior Research Associate at Sumitomo Chemical Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Polymers, Molecules, Ions, Photoresist materials, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

Proceedings Article | 3 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Thin films, Lithography, Polymers, X-rays, Interfaces, Surface properties, Chemical analysis, Photoemission spectroscopy, Fluorine, Polymer thin films

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Scanners, Molecules, Diffusion, Photoresist materials, Line width roughness, Immersion lithography, Semiconducting wafers, Photoresist developing

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Matrices, Scanners, Molecules, Scanning electron microscopy, Line edge roughness, Fluorine, Photoresist processing, Semiconducting wafers, 193nm lithography

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Electron beams, FT-IR spectroscopy, Etching, Scanning electron microscopy, Photoresist materials, Refraction, Critical dimension metrology, Photoresist processing, 193nm lithography

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