Kunyuan Chen
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Wafer-level optics, Lithography, Metrology, Data modeling, Inspection, 3D modeling, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Manufacturing, Electroluminescence, Photomasks, Optical proximity correction, Semiconducting wafers, Autoregressive models, Model-based design

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Scattering, Etching, Quartz, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Quartz, Manufacturing, Photomasks, Optical proximity correction, Neodymium, Semiconducting wafers, Binary data, Phase shifts

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