Kuo-Kuei Fu
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical proximity correction, Lithography, Resolution enhancement technologies, SRAF, Photomasks, Semiconducting wafers, Scattering, Quartz, Etching, Phase shifts

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Etching, Photomasks, Chromium, Resolution enhancement technologies, Neodymium, Quartz, Image processing, Diffractive optical elements, Phase shifts, Binary data

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