Dr. Kurt G. Ronse
Director Lithography at IMEC
Publications (82)

SPIE Conference Volume | November 23, 2018

PROCEEDINGS ARTICLE | August 2, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, New and emerging technologies, Back end of line

SPIE Conference Volume | November 29, 2017

Showing 5 of 82 publications
Conference Committee Involvement (16)
International Conference on Extreme Ultraviolet Lithography 2019
15 September 2019 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2018
17 September 2018 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography
11 September 2017 | Monterey, California, United States
Showing 5 of 16 published special sections
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