CONFERENCE PROCEEDINGS
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Kwang-Hwyi Im
at Rohm and Haas Electronic Materials Korea Ltd
SPIE Involvement:
Author
Publications (4)
SPIE Journal Paper | 22 June 2018
High-speed atomic force microscopy studies of 193-nm immersion photoresists during tetramethylammonium hydroxide development
Johnpeter Ngunjiri, Gregory Meyers, James Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, Hae-Jin Lim
JM3, Vol. 17, Issue 02, 023506, (June 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023506
KEYWORDS: Atomic force microscopy, Line edge roughness, Photoresist processing, Photoresist developing, Image processing, Standards development, Photoresist materials, Optical lithography, Polymers, Pulmonary function tests
Proceedings Article | 25 March 2016 Paper
Chemical trimming overcoat: an enhancing composition and process for 193nm lithography
Cong Liu, Kevin Rowell, Lori Joesten, Paul Baranowski, Irvinder Kaur, Wanyi Huang, JoAnne Leonard, Hae-Mi Jeong, Kwang-Hwyi Im, Tom Estelle, Charlotte Cutler, Gerd Pohlers, Wenyan Yin, Patricia Fallon, Mingqi Li, Hyun Jeon, Cheng Bai Xu, Pete Trefonas
Proceedings Volume 9779, 97791Y (2016) https://doi.org/10.1117/12.2219688
KEYWORDS: 193nm lithography, Lithography, Optical lithography, Double patterning technology, Line width roughness, Critical dimension metrology, Printing, Materials processing, Photoresist materials, Photoresist developing, Semiconducting wafers, Cadmium, Scanning electron microscopy
Proceedings Article | 21 March 2016 Paper
High speed AFM studies of 193 nm immersion photoresists during TMAH development
Johnpeter Ngunjiri, Greg Meyers, Jim Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, Hae-Jin Lim
Proceedings Volume 9779, 97790W (2016) https://doi.org/10.1117/12.2218956
KEYWORDS: Polymers, 193nm lithography, Scanners, Standards development, Immersion lithography, Extreme ultraviolet lithography
Proceedings Article | 20 March 2015 Paper
Top-coatless 193nm positive-tone development immersion resist for logic application
Lian Cong Liu, Tsung Ju Yeh, Yeh-Sheng Lin, Yu Chin Huang, Chien Wen Kuo, Wen Liang Huang, Chia Hung Lin, Chun Chi Yu, Ray Hsu, I-Yuan Wan, Jeff Lin, Kwang-Hwyi Im, Hae Jin Lim, Hyun Jeon, Yasuhiro Suzuki, Cheng Bai Xu
Proceedings Volume 9425, 94251T (2015) https://doi.org/10.1117/12.2086348
KEYWORDS: Polymers, Lithography, Photoresist processing, Diffusion, Logic, Photoresist materials, 193nm lithography, Photoresist developing, Photomasks, Polymerization
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