Kwang-Hwyi Im
at Dow Chemical Co
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | June 22, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Atomic force microscopy, Line edge roughness, Photoresist processing, Photoresist developing, Image processing, Standards development, Photoresist materials, Optical lithography, Polymers, Pulmonary function tests

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Cadmium, Materials processing, Scanning electron microscopy, Printing, Photoresist materials, Line width roughness, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Photoresist developing, 193nm lithography

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Polymers, Scanners, Extreme ultraviolet lithography, Immersion lithography, Standards development, 193nm lithography

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Logic, Polymers, Diffusion, Photoresist materials, Polymerization, Photomasks, Photoresist processing, Photoresist developing, 193nm lithography

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