Dr. Kwang-Woo Choi
SPIE Involvement:
Publications (11)

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555
KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 72722M (2009) https://doi.org/10.1117/12.813757
KEYWORDS: Dielectrics, Scanning electron microscopy, Scattering, X-rays, Data modeling, Sensors, Transistors, Critical dimension metrology, Laser scattering, Silicon

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018
KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

Proceedings Article | 3 April 2008 Paper
Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036
KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

Proceedings Article | 24 March 2008 Paper
Proceedings Volume 6922, 69221Z (2008) https://doi.org/10.1117/12.773558
KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

Showing 5 of 11 publications
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