Dr. Kwang-sun Yoon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Image processing, Scanning electron microscopy, Photomasks, Ion implantation, Logic devices, Nanoimprint lithography, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Etching, Particles, Dielectrics, Silicon, Coating, Reflectivity, Plasma etching, Semiconducting wafers, System on a chip, Plasma

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Electron beam lithography, Etching, Ions, Silicon, Gases, Hydrogen, Plasma etching, Reactive ion etching, Plasma

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Opacity, Glasses, 3D modeling, Finite element methods, Photomasks, SRAF, Binary data

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electronics, Optical lithography, Image compression, Polymers, Diffusion, Electroluminescence, Photoresist materials, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Reflectivity, Control systems, Electroluminescence, Scanning electron microscopy, Photomasks, Line width roughness, Immersion lithography, Critical dimension metrology

Showing 5 of 11 publications
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