Kwangok Jeong
Principle Engineer at Univ of California San Diego
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Resistance, Scanning probe lithography, Monte Carlo methods, Capacitance, Transistors, Double patterning technology, Critical dimension metrology, Cesium, Back end of line

SPIE Journal Paper | July 1, 2011
JM3 Vol. 10 Issue 03
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet lithography, Manufacturing, Lithography, Inspection, Extreme ultraviolet, Data modeling

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Multilayers, Reticles, Data modeling, Manufacturing, Inspection, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Reticles, Image processing, Inspection, Design for manufacturing, Photomasks, Double patterning technology, Line edge roughness, Algorithm development, Device simulation

SPIE Journal Paper | April 1, 2010
JM3 Vol. 9 Issue 02
KEYWORDS: Capacitance, Lithography, Optical proximity correction, Optical lithography, 3D modeling, Transistors, Nano opto mechanical systems, Logic, Diffusion, TCAD

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Electron beam lithography, Logic, Optical lithography, Metals, Diffusion, Photomasks, Double patterning technology, Critical dimension metrology, 193nm lithography

Showing 5 of 8 publications
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