Dr. Kyle Y. Flanigan Profile

Dr. Kyle Y. Flanigan

at Bio Clinical Lab Inc

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Author

Publications (6)

Proceedings Article | 18 March 2010 Paper

Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films

Simi George, Patrick Naulleau, Ahila Krishnamoorthy, Zeyu Wu, Edward Rutter, Joseph Kennedy, Song Yuan Xie, Kyle Flanigan, Thomas Wallow

Proceedings Volume 7636, 763605 (2010) https://doi.org/10.1117/12.848405

KEYWORDS: Line edge roughness, Interfaces, Thin films, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, 3D image processing, Photoresist processing, Head-mounted displays, Liquids

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Proceedings Article | 11 December 2009 Paper

High Si content anti-reflective coatings and their extension to a UV freeze dual patterning process

Joseph Kennedy, ZeYu Wu, Kyle Flanigan, Junyan Dai, Thomas Wallow

Proceedings Volume 7520, 75200O (2009) https://doi.org/10.1117/12.837205

KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Silicon, Double patterning technology, Optical properties, Lithography, Photoresist developing, Chemistry

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Proceedings Article | 1 April 2009 Paper

High-Si content BARC for dual-BARC systems such as trilayer patterning

Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Zhi Liu, Shang-Ho Lin

Proceedings Volume 7273, 72733M (2009) https://doi.org/10.1117/12.814440

KEYWORDS: Photoresist materials, Etching, Optical lithography, Plasma etching, Lithography, Plasma, Silicon, Line width roughness, Scanning electron microscopy, Optical properties

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Proceedings Article | 1 April 2009 Paper

Performance of an ArF siloxane BARC exposed to a 172-nm UV cure for double patterning applications

Ze-Yu Wu, Joseph Kennedy, Song-Yuan Xie, Ron Katsanes, Kyle Flanigan, Junyan Dai, Nikolaos Bekiaris, Hiram Cervera, Glen Mori, Thomas Wallow

Proceedings Volume 7273, 72731I (2009) https://doi.org/10.1117/12.814416

KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Double patterning technology, Silicon, Optical properties, FT-IR spectroscopy, Lithography, Time division multiplexing

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Proceedings Article | 4 December 2008 Paper

High Si content BARC for applications in dual BARC systems such as tri-layer patterning

Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Nicolette Fender, Junichi Takahashi

Proceedings Volume 7140, 71402S (2008) https://doi.org/10.1117/12.804699

KEYWORDS: Etching, Plasma etching, Photoresist materials, Optical lithography, Plasma, Silicon, Lithography, Optical properties, Polymers, Scanning electron microscopy

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Proceedings Article | 4 April 2008 Paper

A high-Si content middle layer for ArF trilayer patterning

Joseph Kennedy, Songyuan Xie, Ronald Katsanes, Kyle Flanigan, Sudip Mukhopadhyay, Benjamin Wu, Edward Rutter, Mark Slezak

Proceedings Volume 6923, 69230W (2008) https://doi.org/10.1117/12.772854

KEYWORDS: Etching, Optical lithography, Plasma etching, Photoresist materials, Silicon, Plasma, Reflectivity, Chemistry, Photoresist processing, Wet etching

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Showing 5 of 6 publications

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