Dr. Kyle Patterson
Engineer at Freescale Semiconductor Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (25)

PROCEEDINGS ARTICLE | March 28, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Metrology, Data modeling, Calibration, Manufacturing, Scanning electron microscopy, Data processing, Optical proximity correction, Critical dimension metrology, Model-based design, Process modeling

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Reticles, Optical lithography, Image processing, Error analysis, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Mathematical modeling, Modeling, Data modeling, Calibration, Computer simulations, Electroluminescence, Printing, Convolution, Critical dimension metrology, Statistical modeling

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Etching, Quartz, Manufacturing, Chromium, Electroluminescence, Printing, Photomasks, Optical proximity correction, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Multilayers, Optical lithography, Metals, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Point spread functions, Optical lithography, Scattering, Etching, Electrons, Light scattering, Photomasks, Optical proximity correction, Convolution, Critical dimension metrology

Showing 5 of 25 publications
Conference Committee Involvement (4)
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
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