Kyohei Sakajiri
RET Staff Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Semiconductors, Lithography, Liquid phase epitaxy, Visualization, Transform theory, Photomasks, Image classification, Double patterning technology, Computational lithography, Optical proximity correction

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Liquid phase epitaxy, Atrial fibrillation, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Resolution enhancement technologies

Proceedings Article | 28 March 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Optical lithography, Visualization, Polymers, Metals, Manufacturing, Monte Carlo methods, Photomasks, Directed self assembly, Design for manufacturability

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Photomasks, Atrial fibrillation, Image quality, Photovoltaics, Lithography, Optical proximity correction, Semiconducting wafers, Phase shifts, Model-based design, Lithographic illumination

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Electroluminescence, Printing, Photomasks, Source mask optimization, SRAF, Semiconducting wafers

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Visualization, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design

Showing 5 of 11 publications
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