Mr. Kyong-Mun Shin
Assistant Manager at PKL Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Defect detection, Inspection, Ion beams, Image transmission, Inspection equipment, Transmittance, Photomasks, Halftones, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Semiconductors, Light sources, Quartz, Inspection, Chromium, Transmittance, Photomasks, Semiconducting wafers, Phase shifts, Defect inspection

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