Kyoungyoung Cho
Principle Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Area of Expertise:
Photolithography , Photoresist , Overlay , EUV lithography , ArF immersion
Publications (17)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Calibration, Diffusion, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Photons, Silicon, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Oxides, Carbon, Electron beam lithography, Optical lithography, Nanoparticles, Spectroscopy, Ions, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Oxides, Lithography, Electron beam lithography, Nanoparticles, Etching, Metals, Photoresist materials, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Polymers, Molecules, Diffusion, Amplifiers, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Semiconducting wafers

Showing 5 of 17 publications
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