Dr. Kyoung-Yoon Bang
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Etching, Silicon, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Critical dimension metrology, Ruthenium, EUV optics

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Ultraviolet radiation, Chromium, Atomic force microscopy, Optical testing, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Scatter measurement, Binary data

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Refractive index, Optical lithography, Inspection, Reflectivity, Chromium, Scatterometry, Transmittance, Photomasks, Critical dimension metrology, Spectrophotometry

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