Kyu-Tae Sun
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Reticles, Metrology, Optical lithography, Etching, Scanners, Control systems, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Diffraction, Metrology, Optical lithography, Error analysis, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Lithium, Optical lithography, Data modeling, Process control, Semiconductor manufacturing, Semiconducting wafers, Yield improvement, Performance modeling, Overlay metrology, Process modeling

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Etching, Image processing, Inspection, Control systems, Scatterometry, Process control, Measurement devices, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Metrology, Principal component analysis, Scanners, Time metrology, Semiconductor manufacturing, Immersion lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 11 publications
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