Dr. Kyung-Me Kim
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Scanners, Diffusion, Scatterometry, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Polymers, Silicon, Inspection, Reflectivity, Scanning electron microscopy, Time metrology, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Line edge roughness, Photoresist developing, Temperature metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Sensors, Polymers, Ultraviolet radiation, Photoresist materials, Polymerization, Palladium, Manganese, Critical dimension metrology, Line edge roughness

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