Dr. Kyung M. Lee
Group Leader Meterology at Intel Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Cadmium, Spectroscopy, Scanning electron microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Cadmium, Etching, Scanners, Photomasks, Phase measurement, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | October 31, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Metrology, Polarization, Scanners, Image resolution, Printing, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | May 12, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Diffraction, Phase shifting, Metrology, Polarization, Etching, Scanners, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Cadmium, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Binary data

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Polarization, Imaging systems, Etching, Scanners, Near field, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

Showing 5 of 12 publications
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