Dr. Kyung M. Lee
Group Leader Meterology at pacific biosciences
SPIE Involvement:
Publications (12)

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scanning electron microscopy, Scatterometry, Photomasks, Lithography, Spectroscopy, Metrology, Cadmium, Line edge roughness

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Photomasks, Metrology, Phase measurement, Phase shifts, Semiconducting wafers, Scanners, Critical dimension metrology, Etching, Cadmium, Resolution enhancement technologies

Proceedings Article | 31 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Phase shifts, Photomasks, Scanners, Phase measurement, Image resolution, Metrology, Printing, Polarization, Semiconducting wafers

Proceedings Article | 12 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Scanners, Photomasks, Phase measurement, Etching, Polarization, Diffraction, Phase shifts, Phase shifting, Metrology, Semiconducting wafers

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Scatter measurement, Lithography, Binary data, Metrology

Showing 5 of 12 publications
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