Dr. Lalit Shokeen
at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Scanners, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Process modeling

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top