Lance D. Williamson
at Univ of Chicago
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Nanostructures, Optical lithography, Polymers, Chemistry, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Directed self assembly, Thermodynamics, Molecular self-assembly

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Etching, Chemistry, Directed self assembly, Plasma etching, Line edge roughness, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Annealing, Silicon, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Neodymium, Tolerancing

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Statistical analysis, Data modeling, Scattering, Polymers, X-rays, Reflectivity, Atomic force microscopy, Grazing incidence, Statistical modeling, Systems modeling

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Etching, Annealing, Chemistry, Scanning electron microscopy, Photoresist materials, Directed self assembly, Plasma etching, Picosecond phenomena, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Optical lithography, Etching, Image processing, Scanners, Silicon, Scanning electron microscopy, Photomasks, Directed self assembly, Optical alignment, Semiconducting wafers

Showing 5 of 6 publications
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