Lance D. Williamson
at Univ of Chicago
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Polymers, Molecular self-assembly, Monte Carlo methods, Chemistry, Nanostructures, Computer simulations, Thermodynamics, Scanning electron microscopy, Optical lithography, Directed self assembly

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Chemistry, Tolerancing, Lithography, Semiconducting wafers, Line edge roughness, Thin films, Plasma etching, Etching, Polymethylmethacrylate, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Scanning electron microscopy, Etching, Optical lithography, Tolerancing, Silicon, Polymethylmethacrylate, Annealing, Picosecond phenomena, Neodymium, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Scattering, X-rays, Polymers, Data modeling, Atomic force microscopy, Reflectivity, Statistical analysis, Statistical modeling, Grazing incidence, Systems modeling

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Etching, Annealing, Plasma etching, Scanning electron microscopy, Lithography, Semiconducting wafers, Photoresist materials, Picosecond phenomena, Chemistry, Directed self assembly

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Optical lithography, Optical alignment, Etching, Semiconducting wafers, Photomasks, Scanning electron microscopy, Image processing, Silicon, Scanners, Directed self assembly

Showing 5 of 6 publications
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