Prof. Larissa Juschkin
Professor at RWTH Aachen Univ
SPIE Involvement:
Author
Publications (27)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical design, Phase shifting, Holography, Photomasks, Extreme ultraviolet, Computational lithography, Photoresist processing, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Electron beam lithography, Modulation, Photoresist materials, Image quality, Photomasks, Extreme ultraviolet, Semiconducting wafers, Plasma, Phase shifts

SPIE Journal Paper | October 17, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Ultraviolet radiation, Diffraction, Electron beam lithography, Spatial coherence

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Photoresist materials, Photomasks, Extreme ultraviolet, Spatial coherence, Extreme ultraviolet lithography, Modulation transfer functions, Semiconducting wafers

PROCEEDINGS ARTICLE | September 22, 2015
Proc. SPIE. 9589, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XI
KEYWORDS: Diffraction, Coherence imaging, Optical filters, Mirrors, Visible radiation, Light sources, Microscopy, Extreme ultraviolet, Spatial coherence, Plasma

PROCEEDINGS ARTICLE | May 12, 2015
Proc. SPIE. 9510, EUV and X-ray Optics: Synergy between Laboratory and Space IV
KEYWORDS: Multilayers, X-rays, Interfaces, Diffusion, Reflectivity, Scanning electron microscopy, Extreme ultraviolet, Boron, Extreme ultraviolet lithography, Grazing incidence

Showing 5 of 27 publications
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