Dr. Larry F. Rhodes
Research Fellow at Promerus LLC
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Transparency, Etching, Polymers, Hydrogen, Resistance, Photoresist materials, Polymerization, Palladium, Absorbance

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Polymers, Ultraviolet radiation, Molecules, Hydrogen, Photoresist materials, Solids, Photoresist developing

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Molecules, X-ray diffraction, Hydrogen, Photoresist materials, Solids, Palladium, Polymer thin films

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Rutherfordium, Annealing, Diffusion, Resistance, Image quality, Plasma etching, Binary data, Temperature metrology, Chemically amplified resists

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Oxides, Lithography, Transparency, Rutherfordium, Etching, Polymers, Resistance, Absorbance, Plasma etching, Fluorine

Showing 5 of 12 publications
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