Dr. Lars-Åke Ragnarsson Profile

Dr. Lars-Åke Ragnarsson

at imec

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Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation

Sustainable semiconductor processing solutions: status and guidelines

Andrea Firrincieli, Emily Gallagher, Herbert Struyf, Frank Holsteyns, Cedric Rolin, Lars-Åke Ragnarsson

Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3012691

KEYWORDS: Sustainability, Etching, Semiconductor manufacturing, Chemical mechanical planarization, Carbon, Atomic layer deposition, Nanostructures, Deposition processes, Very large scale integration, Vacuum

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Proceedings Article | 10 April 2024 Presentation + Paper

Investigation of die-cost scaling scenarios in future technologies

G. Mirabelli, Y.-P. Tsai, Y.-H. Chang, D. Velenis, R.-H. Kim, J. Myers, L.-Å. Ragnarsson, O. Zografos, G. Hellings

Proceedings Volume 12954, 129540E (2024) https://doi.org/10.1117/12.3010149

KEYWORDS: Semiconductor manufacturing, Back end of line, Logic, Front end of line

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Proceedings Article | 9 April 2024 Presentation + Paper

Where to apply sustainability optimizations in process flows?

Konstantina Filippidou, Philippe Bezard, I-Yun Liu, Cedric Rolin, Frederic Lazzarino, Lars-Åke Ragnarsson

Proceedings Volume 12958, 129580L (2024) https://doi.org/10.1117/12.3012753

KEYWORDS: Etching, Chemistry, Gases, Silica, Sustainability, Optical lithography, Fluorine, Dry etching, Climate change, Semiconducting wafers

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Proceedings Article | 1 May 2023 Presentation + Paper

Sustainable semiconductor manufacturing: lessons for lithography and etch

Emily Gallagher, Philippe Bezard, Lizzie Boakes, Andrea Firrincieli, Cedric Rolin, Lars-Åke Ragnarsson

Proceedings Volume 12499, 124990F (2023) https://doi.org/10.1117/12.2662857

KEYWORDS: Etching, Carbon, Hydrogen, Lithography, Scanners, Semiconductors, Sustainability

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Proceedings Article | 13 June 2022 Presentation

MOL patterning challenges in scaled SRAM with vertical Surrounding Gate Transistors (SGT)

Zheng Tao, Yisuo Li, Waikin Li, Minsoo Kim, Basoene Briggs, Katia Devriendt, Lieve Teugels, Farid Sebai, Christophe Lorant, Clement Porret, Erik Rosseel, Alfonso Sepúlveda Márquez, Nicolas Jourdan, Juergen Boemmels, Jerome Mitard, Philippe Matagne, Efrain Altamirano-Sánchez, Lars-ake Ragnarsson, Anish Dangol, Dmitry Batuk, Gerardo Tadeo Martinez Alanis, Jef Geypen, Kenichi Kanazawa, Testuo Izawa, Masakazu Kakumu, Koji Sakui, Nozomu Harada

Proceedings Volume PC12056, PC120560B (2022) https://doi.org/10.1117/12.2614772

KEYWORDS: Optical lithography, Metals, Etching, Transistors, Atomic layer deposition, Silica, Inspection, Electrodes, Transmission electron microscopy, System on a chip

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