Dr. Laurens Kwakman
at FEI Co
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Signal to noise ratio, Metrology, Silicon, 3D metrology, Scanning transmission electron microscopy, Nanowires

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Etching, Dielectrics, Transmission electron microscopy, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Scanning transmission electron microscopy

Proceedings Article | 2 August 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 3 October 2016
Proc. SPIE. 9967, Developments in X-Ray Tomography X
KEYWORDS: Signal to noise ratio, Electron beams, Sensors, X-rays, Scanning electron microscopy, Tomography, Spatial resolution, X-ray imaging, X-ray detectors, Nanowires

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Contamination, Particles, Silicon, Inspection, Nondestructive evaluation, Platinum, Scanning electron microscopy, Transmission electron microscopy, Semiconducting wafers, Gallium

Proceedings Article | 19 September 1995
Proc. SPIE. 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing
KEYWORDS: Oxides, Contamination, Iron, Silicon, Diffusion, Oxygen, Aluminum, Sodium, Semiconducting wafers, Oxidation

Showing 5 of 6 publications
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