Dr. Laurens de Winter
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Reticles, Deep ultraviolet, Imaging systems, Scanners, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 30 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Reticles, Imaging systems, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Logic, Lithographic illumination, Image acquisition, Photomasks, Image enhancement, Extreme ultraviolet lithography, Source mask optimization, SRAF, Critical dimension metrology, 3D image processing

SPIE Journal Paper | 30 November 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Critical dimension metrology, Lithographic illumination, Extreme ultraviolet lithography, Lithography, Tantalum, Photomasks, Diffraction, Extreme ultraviolet, Line width roughness, Image acquisition

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Image acquisition, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Tantalum

Showing 5 of 15 publications
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