Laurent Depre
Application Manager at ASML France Sarl
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Logic, Optical lithography, Visualization, Imaging systems, Databases, Optical proximity correction, SRAF, Imaging arrays, System on a chip

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Scanners, Inspection, Scanning electron microscopy, Finite element methods, Computational lithography, Semiconducting wafers

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Image processing, Reliability, 3D modeling, Scanning electron microscopy, 3D metrology, Photomasks, Artificial intelligence, Optical proximity correction, Critical dimension metrology, Evolutionary algorithms

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Defect detection, Etching, Metals, Image processing, Scanners, 3D modeling, Scanning electron microscopy, Data processing, Process control, Finite element methods, Photomasks, Computational lithography, Semiconducting wafers

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Logic, Optical lithography, Calibration, Image resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 17 publications
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