Dr. Laurent Dieu
US Technical Sales & Account Manager at Toppan Photomasks, Inc.
SPIE Involvement:
Publications (13)

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.539074
KEYWORDS: Photomasks, Semiconducting wafers, Reflectors, Binary data, Extreme ultraviolet lithography, Multilayers, Critical dimension metrology, Reticles, Printing, Optical lithography

Proceedings Article | 17 December 2003 Paper
Eric Johnstone, Laurent Dieu, Christian Chovino, Julio Reyes, Dongsung Hong, Prakash Krishnan, Dianna Coburn, Christian Capella
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518262
KEYWORDS: Photomasks, Air contamination, Contamination, Pellicles, Reticles, Binary data, Glasses, Chemistry, Inspection, Environmental sensing

Proceedings Article | 17 December 2003 Paper
Gim Chen, Julio Reyes, James Wood, Ismail Kashkoush, Laurent Dieu, Richard Novak
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518247
KEYWORDS: Photomasks, Transmittance, Reticles, Chemistry, Photoresist processing, Binary data, Mask cleaning, Reflectivity, Photoresist materials, Particles

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518259
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Reflectivity, Inspection, Reflectors, Lithography, Image processing

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518252
KEYWORDS: Optical design, Photomasks, Quartz, Etching, Semiconducting wafers, Printing, Critical dimension metrology, Manufacturing, Line edge roughness, Tolerancing

Showing 5 of 13 publications
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