Dr. Laurent Dieu
Integration Manager/New product & project Manager at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 May 2004 Paper
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Reflectors, Multilayers, Reticles, Optical lithography, Printing, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical design, Etching, Quartz, Manufacturing, Printing, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Tolerancing

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Antireflective coatings, Reticles, Spatial frequencies, Scanners, Reflectivity, Chromium, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Air contamination, Glasses, Chemistry, Inspection, Pellicles, Photomasks, Environmental sensing, Binary data

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Particles, Chemistry, Reflectivity, Photoresist materials, Transmittance, Photomasks, Photoresist processing, Binary data, Mask cleaning

Showing 5 of 13 publications
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