Dr. Laurent Dubost
at HEF Groupe
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 29 April 2016 Paper
M. Bichotte, T. Kämpfe, W. Iff, F. Celle, S. Reynaud, T. Pouit, A. Soum-Glaude, A. Le Gal, L. Dubost, Y. Jourlin
Proceedings Volume 9898, 98980O (2016) https://doi.org/10.1117/12.2225072
KEYWORDS: Photoresist materials, Absorption, Diffraction gratings, Sputter deposition, Multilayers, Silicon, Semiconducting wafers, Reflectors, Optical lithography, Absorbance, Reflectivity, Solar energy, Nitrogen, Refractive index, Temperature metrology, Receivers

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