Laurent Lecarpentier
Lithography Process & Mask Team Leader at St Microelectronics
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Reticles, Metrology, Logic, Scanners, Process control, Photomasks, Semiconducting wafers, Overlay metrology, Process engineering

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Logic, Inspection, Scanning electron microscopy, Transmission electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Defect inspection

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Metrology, Detection and tracking algorithms, Etching, Scanners, Error analysis, Inspection, Scanning electron microscopy, Semiconducting wafers, Overlay metrology

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