Laurent Lecarpentier
Lithography Process & Mask Team Leader at St Microelectronics
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Overlay metrology, Semiconducting wafers, Process control, Reticles, Lithography, Logic, Photomasks, Process engineering, Scanners

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Logic, Transmission electron microscopy, Defect inspection, Inspection, Process control, Scanning electron microscopy, Reticles

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Reticles, Scanning electron microscopy, Error analysis, Metrology, Detection and tracking algorithms, Scanners, Inspection

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