Dr. Laurent Pain
Patterning Program Manager at CEA-LETI
SPIE Involvement:
Conference Program Committee | Author
Publications (57)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Lenses, Time metrology, Distance measurement, Process control, Raster graphics, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Oxides, Optical lithography, Silicon, Materials processing, Photomasks, Directed self assembly, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Dry etching, Annealing, Silicon, Scanning electron microscopy, Directed self assembly, Plasma etching, Picosecond phenomena

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Polymethylmethacrylate, Etching, Ultraviolet radiation, Silicon, Scanning electron microscopy, Surface properties, Line width roughness, Directed self assembly, Plasma, Nanowires

Showing 5 of 57 publications
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