Dr. Laurent Pain
Lithography Lab Manager at CEA-LETI
SPIE Involvement:
Conference Program Committee | Author
Publications (55)

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Lenses, Time metrology, Distance measurement, Process control, Raster graphics, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Dry etching, Annealing, Silicon, Scanning electron microscopy, Directed self assembly, Plasma etching, Picosecond phenomena

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Oxides, Optical lithography, Silicon, Materials processing, Photomasks, Directed self assembly, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Polymethylmethacrylate, Etching, Ultraviolet radiation, Silicon, Scanning electron microscopy, Surface properties, Line width roughness, Directed self assembly, Plasma, Nanowires

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Lithographic illumination, Photomasks, Integrated optics, Optical alignment, Semiconducting wafers

Showing 5 of 55 publications
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