Dr. Laurent Pain
Patterning Program Manager at CEA-LETI
SPIE Involvement:
Conference Program Committee | Author
Publications (60)

Proceedings Article | 16 August 2019 Presentation
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Wafer-level optics, Semiconducting wafers, Critical dimension metrology, Electron beams, Optical alignment, Maskless lithography, Switching, Electron beam lithography, Standards development, Lithography

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Adhesives, Ultraviolet radiation, Silicon, Thin films, Etching, Coating

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Etching, Lithography, Optical lithography, Wet etching, HF etching, Critical dimension metrology, Silicon, System on a chip, Tin

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Machine learning, Scatterometry, Semiconducting wafers, Lithography, Metrology, Channel projecting optics, Wafer-level optics, Reflectance spectroscopy, Inverse optics, Electron beam direct write lithography, Maskless lithography

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Semiconducting wafers, Overlay metrology, Prototyping, Optical scanning, Scanning electron microscopy, Lithography, Line width roughness, Optical alignment, Electron beams, Silicon

Showing 5 of 60 publications
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