Laurent C. Tuo
Deputy Director at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (12)

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Metrology, Databases, Manufacturing, Inspection, Computing systems, Photomasks, Operating systems, Semiconducting wafers, Defect inspection

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Glasses, Particles, Inspection, Oxygen, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Plasma

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Defect detection, Detection and tracking algorithms, Inspection, Time metrology, Dysprosium, Algorithm development, Optics manufacturing, Standards development, Defect inspection

Proceedings Article | 20 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Contamination, Visualization, Air contamination, Scanners, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Defect inspection

Proceedings Article | 16 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, Deep ultraviolet, 3D modeling, Near field, Photomasks, Extreme ultraviolet, Optical proximity correction, Spherical lenses, Semiconducting wafers

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Holons

Showing 5 of 12 publications
Conference Committee Involvement (1)
Photomask Technology
12 September 2016 | San Jose, California, United States
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