Dr. Lawrence S. Melvin
Technical Program Manager at Synopsys Inc
SPIE Involvement:
Senior status | Conference Program Committee | Author
Publications (59)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Ionizing radiation, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Reflectors, Reticles, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Scattering, Light scattering, Manufacturing, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Silicon, Reflectivity, Near field, Photomasks, Extreme ultraviolet, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Optical lithography, Lithographic illumination, Data modeling, Image processing, Error analysis, Process control, Photomasks, Cadmium sulfide, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 59 publications
Conference Committee Involvement (3)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
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