Dr. Lawrence S. Melvin
Technical Program Manager at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (64)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Light scattering, Reflectivity, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, Photoresist materials, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Systems modeling

Proceedings Article | 23 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Lithography, Data modeling, Etching, Metals, Dielectrics, Photoresist materials, Photomasks, Stochastic processes, Process modeling, Defect inspection

Proceedings Article | 24 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Defect detection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Failure analysis, Stochastic processes, Defect inspection

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Multilayers, Optical lithography, Data modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Showing 5 of 64 publications
Conference Committee Involvement (5)
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
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