Lay Cheng Choo
at DenseLight Semiconductors Pte Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | September 14, 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Electroluminescence, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, 193nm lithography, Phase shifts

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Scanners, Scanning electron microscopy, Photoresist materials, Image transmission, Photomasks, Optical proximity correction, Nanoimprint lithography, Photomicroscopy, Photoresist processing, Phase shifts

PROCEEDINGS ARTICLE | June 29, 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Deep ultraviolet, Image processing, Image transmission, Microelectronics, Photomasks, Laser optics, Phase shifts

PROCEEDINGS ARTICLE | August 13, 1997
Proc. SPIE. 3061, Infrared Technology and Applications XXIII
KEYWORDS: Target detection, Infrared search and track, Staring arrays, Infrared sensors, Mirrors, Optical design, Electronics, Sensors, Image processing, Signal processing

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