Mr. Le Hong
Product Engineer at
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

SPIE Journal Paper | September 29, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Code division multiplexing, Neck, Lithography, Optical lithography, Modulation, Visualization, Ions, Lens design, Optical resolution, Photomasks, Extreme ultraviolet, Directed self assembly, Immersion lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Metals, Computer programming, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

SPIE Journal Paper | September 11, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Visualization, Transmission electron microscopy, Printing, Photomasks, Dysprosium, Directed self assembly, Source mask optimization, Optical proximity correction, Neodymium

Showing 5 of 18 publications
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