Le Hong
Product Engineer at Mentor a Siemens Business
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 23 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Wafer-level optics, Defect detection, Data modeling, Feature extraction, Machine learning, Optical proximity correction, High volume manufacturing, Semiconducting wafers, Optics manufacturing, Statistical modeling

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Optical proximity correction, SRAF

Proceedings Article | 30 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top