Dr. Lee J. Richter
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Molecules, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Thin films, Ellipsometry, Contamination, Imaging systems, Dielectrics, Polarizers, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Contamination, Molecules, Electrons, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, EUV optics, Protactinium

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Ellipsometry, Data modeling, Polymers, Annealing, In situ metrology, Atomic force microscopy, Scatterometry, Solids, Nanoimprint lithography, Statistical modeling

PROCEEDINGS ARTICLE | September 13, 2007
Proc. SPIE. 6658, Organic Field-Effect Transistors VI
KEYWORDS: Semiconductors, Gold, Data modeling, Electrodes, Polymers, Resistance, Transistors, Field effect transistors, Information operations, Instrument modeling

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top