Dr. Lee J. Richter
at National Institute of Standards and Technology
SPIE Involvement:
Conference Program Committee | Author
Publications (10)

Proceedings Article | 26 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Molecules, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Ruthenium, EUV optics

Proceedings Article | 26 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Semiconducting wafers

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Thin films, Ellipsometry, Contamination, Imaging systems, Dielectrics, Polarizers, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Contamination, Molecules, Electrons, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, EUV optics, Protactinium

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Ellipsometry, Data modeling, Polymers, Annealing, In situ metrology, Atomic force microscopy, Scatterometry, Solids, Nanoimprint lithography, Statistical modeling

Showing 5 of 10 publications
Conference Committee Involvement (1)
Physical Chemistry of Semiconductor Materials and Interfaces IX
23 August 2020 | San Diego, California, United States
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