Mr. Lee E. Trimble Profile

Mr. Lee E. Trimble

at Lucent Technologies

SPIE Involvement:

Author

Publications (8)

PROCEEDINGS ARTICLE | July 5, 2000

High-density lithography using attenuated phase-shift mask and negative resist

Proc. SPIE. 4000, Optical Microlithography XIII

KEYWORDS: Lithography, Manufacturing, Printing, Photoresist materials, Microelectronics, Photomasks, Integrated circuits, Critical dimension metrology, Binary data, Phase shifts

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PROCEEDINGS ARTICLE | June 29, 1998

New variable-transmission illumination technique optimized with design rule criteria

Proc. SPIE. 3334, Optical Microlithography XI

KEYWORDS: Carbon, Lithography, Diffraction, Lithographic illumination, Quartz, Software development, Transmittance, Photomasks, Tolerancing, Fiber optic illuminators

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PROCEEDINGS ARTICLE | June 8, 1998

Toward a unified advanced CD-SEM specification for sub-0.18-um technology

Proc. SPIE. 3332, Metrology, Inspection, and Process Control for Microlithography XII

KEYWORDS: Lithography, Metrology, Contamination, Calibration, Pattern recognition, Electron microscopes, Scanning electron microscopy, Semiconducting wafers, Wafer testing, Standards development

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PROCEEDINGS ARTICLE | December 27, 1996

Lithography tricks and tribulations

Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Binary data, Process modeling, Resolution enhancement technologies

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PROCEEDINGS ARTICLE | June 24, 1993

Performance of the Hampshire Instruments Model 5000 proximity x-ray stepper

Proc. SPIE. 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III

KEYWORDS: Metrology, X-rays, Control systems, Photomasks, Optical alignment, Critical dimension metrology, Photoresist processing, Semiconducting wafers, X-ray lithography, Instrument modeling

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PROCEEDINGS ARTICLE | July 9, 1992

Evaluation of a laser-based proximity x-ray stepper

Proc. SPIE. 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II

KEYWORDS: Lithography, X-rays, X-ray sources, Silicon, Photomasks, Optical alignment, Semiconducting wafers, X-ray lithography, Pulsed laser operation, Plasma

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PROCEEDINGS ARTICLE | July 9, 1992

Production of x-ray mask blanks for a point source stepper

Proc. SPIE. 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II

KEYWORDS: X-ray optics, Glasses, X-rays, Silicon, Transmittance, Photomasks, Low pressure chemical vapor deposition, Synchrotrons, X-ray lithography, Optics manufacturing

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PROCEEDINGS ARTICLE | May 1, 1990

Control of optical and mechanical properties of polycrystalline silicon membranes for x-ray masks

Proc. SPIE. 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX

KEYWORDS: Silica, Glasses, X-rays, Silicon, Transmittance, Photomasks, Low pressure chemical vapor deposition, Semiconducting wafers, X-ray lithography, X-ray technology

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Showing 5 of 8 publications

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