Lee E. Trimble
at Lucent Technologies
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Manufacturing, Printing, Photoresist materials, Microelectronics, Photomasks, Integrated circuits, Critical dimension metrology, Binary data, Phase shifts

PROCEEDINGS ARTICLE | June 29, 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Carbon, Lithography, Diffraction, Lithographic illumination, Quartz, Software development, Transmittance, Photomasks, Tolerancing, Fiber optic illuminators

PROCEEDINGS ARTICLE | June 8, 1998
Proc. SPIE. 3332, Metrology, Inspection, and Process Control for Microlithography XII
KEYWORDS: Lithography, Metrology, Contamination, Calibration, Pattern recognition, Electron microscopes, Scanning electron microscopy, Semiconducting wafers, Wafer testing, Standards development

PROCEEDINGS ARTICLE | December 27, 1996
Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Binary data, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 24, 1993
Proc. SPIE. 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
KEYWORDS: Metrology, X-rays, Control systems, Photomasks, Optical alignment, Critical dimension metrology, Photoresist processing, Semiconducting wafers, X-ray lithography, Instrument modeling

PROCEEDINGS ARTICLE | July 9, 1992
Proc. SPIE. 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
KEYWORDS: Lithography, X-rays, X-ray sources, Silicon, Photomasks, Optical alignment, Semiconducting wafers, X-ray lithography, Pulsed laser operation, Plasma

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top