Dr. Lei Sun
SPIE Involvement:
Publications (29)

Proceedings Article | 9 April 2018 Paper
Xun Xiang, Genevieve Beique, Lei Sun, Andre Labonte, Catherine Labelle, Bhaskar Nagabhirava, Phil Friddle, Stefan Schmitz, Michael Goss, Dominik Metzler, John Arnold
Proceedings Volume 10589, 105890K (2018) https://doi.org/10.1117/12.2297413
KEYWORDS: Etching, Extreme ultraviolet, Deposition processes, Optical lithography, Line width roughness, Line edge roughness, Plasma etching, Photoresist processing, Plasma, Extreme ultraviolet lithography

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830D (2018) https://doi.org/10.1117/12.2297027
KEYWORDS: Aberration theory, Zernike polynomials, Diffraction, Extreme ultraviolet lithography, Wavefronts, Error analysis, Scanners, Photomasks, Overlay metrology, Lithography

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10451, 104510S (2017) https://doi.org/10.1117/12.2280339
KEYWORDS: Pellicles, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Extreme ultraviolet lithography, Transmittance, Temporal coherence, Particles, Nickel, High volume manufacturing

Proceedings Article | 26 April 2017 Presentation
Proceedings Volume 10147, 1014710 (2017) https://doi.org/10.1117/12.2261428
KEYWORDS: Optical proximity correction, Silicon photonics, High volume manufacturing, Sun, Optical lithography, Current controlled current source

Proceedings Article | 28 March 2017 Presentation + Paper
Proceedings Volume 10145, 101450Z (2017) https://doi.org/10.1117/12.2258602
KEYWORDS: Line scan image sensors, Line edge roughness, Statistical analysis, Image quality, Process control, Critical dimension metrology, Line width roughness, Extreme ultraviolet lithography, Correlation function, Computer simulations, Photoresist materials, Metrology, Edge roughness, Scanning electron microscopy, Edge detection, Lithography, Error analysis

Showing 5 of 29 publications
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