Dr. Lei Sun
at
SPIE Involvement:
Senior status | Author
Publications (29)

Proceedings Article | 9 April 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Deposition processes, Line edge roughness, Photoresist processing, Plasma

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 26 April 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Sun, Optical proximity correction, High volume manufacturing, Silicon photonics, Current controlled current source

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Edge detection, Metrology, Statistical analysis, Error analysis, Computer simulations, Scanning electron microscopy, Photoresist materials, Image quality, Process control, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Edge roughness, Line scan image sensors, Correlation function

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

Showing 5 of 29 publications
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