Dr. Lei Wan
at Western Digital Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 September 2023 Presentation + Paper
Matthew Daniels, William Borders, Nitin Prasad, Advait Madhavan, Sidra Gibeault, Temitayo Adeyeye, Liam Pocher, Lei Wan, Michael Tran, Jordan Katine, Daniel Lathrop, Brian Hoskins, Tiffany Santos, Patrick Braganca, Mark Stiles, Jabez McClelland
Proceedings Volume 12656, 126560B (2023) https://doi.org/10.1117/12.2682099
KEYWORDS: Stochastic processes, Magnetic tunnel junctions, Neural networks, Magnetism, Computer architecture, Resistors

Proceedings Article | 4 October 2022 Presentation
Proceedings Volume PC12205, PC122050L (2022) https://doi.org/10.1117/12.2632314
KEYWORDS: Neural networks, Magnetism, Binary data, Signal processing, Resistance, Performance modeling, Instrument modeling

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11610, 116100L (2021) https://doi.org/10.1117/12.2584668
KEYWORDS: Directed self assembly, Thermodynamics, Thin films, Semiconductors, Photomasks, Optical lithography, Critical dimension metrology, Annealing

SPIE Journal Paper | 7 August 2012
JM3, Vol. 11, Issue 3, 031405, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031405
KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

Proceedings Article | 21 March 2012 Paper
K. Patel, R. Ruiz, J. Lille, L. Wan, E. Dobiz, H. Gao, N. Robertson, T. Albrecht
Proceedings Volume 8323, 83230U (2012) https://doi.org/10.1117/12.916589
KEYWORDS: Lithography, Double patterning technology, Etching, Chromium, Optical lithography, Silicon, Reactive ion etching, Plasma, Beam propagation method, Directed self assembly

Showing 5 of 7 publications
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